Martin P. Hoffman, received a B.S in Mechanical Engineering from the New Jersey Institute of Technology and a J.D. from the George Washington University Law School. Mr. Hoffman is admitted to practice law in Virginia, the District of Columbia and before the United States Patent and Trademark Office. Prior to joining Stein IP LLC, Mr. Hoffman was a founding member of Hoffman, Wasson & Gitler, P.C. Mr. Hoffman has previously worked as a Patent Examiner examining applications for mechanical and electromechanical devices and fluidic control systems.
Mr. Hoffman's practice focuses on all areas of intellectual property law including patent and trademark prosecution and protection, as well as opinions and client counseling. Mr. Hoffman has been a lecturer on a number of intellectual property related subjects, including the ALI/ABA Patent Law Seminar (November, 1990); ALI/ABA Trademark Law Seminars (April 1994) & (April 2002), Hungarian Patent Law Association (MIE) (Nov. 1998).
Extensive experience in supervising search efforts; preparation of opinions pertaining to patentability; infringement risk; state of the art; preparation and prosecution of patent application in diverse areas of technology, particularly the mechanical arts; filing Appeal Briefs with the Board of Patent Appeals and Interferences; presenting oral arguments before the BPAI; supervising foreign patent prosecution; patent and trademark licensing.
Additionally, Mr. Hoffman has extensive experience conducting trademark searches; preparing opinions regarding registerability of marks and potential infringement of marks; domestic trademark prosecution; filing Briefs with the Trademark Trial and Appeal Board; prosecuting trademark opposition and cancellation proceedings; presenting oral arguments before the TAAB; supervising foreign trademark prosecution.
Mr. Hoffman has testified as expert witness in several patent infringement cases in Federal District Courts and Court of Claims; prepared expert's reports in several other cases that did not proceed to trial.